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Published in 2020 at "Nanotechnology"
DOI: 10.1088/1361-6528/ab704a
Abstract: Electrochemical etching of silicon carbide (SiC) material has received increasing attention in recent years, due to its simple procedure, low cost and significance in exploring novel optoelectronic devices. In this paper, 4H-SiC substrates were electrochemically…
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Keywords:
constant current;
layering phenomenon;
sic porous;
electrochemical etching ... See more keywords