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Published in 2017 at "Thin Solid Films"
DOI: 10.1016/j.tsf.2017.12.019
Abstract: Abstract Titanium oxide layers were prepared by sputter deposition with plasma emission monitoring in the whole stoichiometry range between Ti and TiO2 without and with substrate heating to 240 °C. The layers were characterized with regard…
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Keywords:
layers structural;
magnetron sputtered;
structural electrical;
tio layers ... See more keywords