Accurate Determination of the Low-Light-Level Absorption of DUV-Fused Silica at 193 nm with Laser Calorimetry
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DOI: 10.3390/photonics11040305
Abstract: The low-light-level absorption coefficient of OH-contained and H2-impregnated synthetic fused silica material in 193 nm optical lithography application is determined via a laser calorimetry measurement. The fluence and repetition rate dependences of the absorptances of… read more here.
Keywords: low light; level absorption; absorption; fused silica ... See more keywords