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Published in 2017 at "Carbon"
DOI: 10.1016/j.carbon.2017.08.026
Abstract: Abstract The time evolution of the Fermi level of the graphene channel during a gas sensing process is systematically investigated. A Fermi level converging behavior at negative back-gate voltage and a Fermi level pinning behavior…
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Keywords:
level pinning;
graphene channel;
gas;
level ... See more keywords
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Published in 2018 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.7b18454
Abstract: Hexagonal boron nitride (h-BN) is an important insulating substrate for two-dimensional (2D) heterostructure devices and possesses high dielectric strength comparable to SiO2. Here, we report two clear differences in their physical properties. The first one…
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Keywords:
level pinning;
boron nitride;
hexagonal boron;
interface ... See more keywords
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Published in 2018 at "Nanoscale"
DOI: 10.1039/c8nr02843e
Abstract: Two-dimensional (2D) SnSe is a very promising material for semiconducting devices due to its novel properties. However, the contact behavior between a 2D SnSe sheet and a three-dimensional (3D) metal surface shows an un-tunable Schottky…
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Keywords:
level pinning;
schottky barrier;
fermi level;
snse sheet ... See more keywords
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Published in 2019 at "Nanoscale"
DOI: 10.1039/c9nr02643f
Abstract: Hybrid organic inorganic perovskites are ideal candidates for absorber layers in next generation thin film photovoltaics. The polycrystalline nature of these layers imposes substantial complications for the design of high efficiency devices since the optoelectronic…
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Keywords:
level pinning;
methylammonium lead;
pinning methylammonium;
lead iodide ... See more keywords
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Published in 2020 at "Nanoscale"
DOI: 10.1039/d0nr01379j
Abstract: Gap states and Fermi level pinning play an important role in all semiconductor devices, but even more in transition metal dichalcogenide-based devices due to their high surface to volume ratio and the absence of intralayer…
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Keywords:
level pinning;
state distribution;
fermi level;
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Published in 2022 at "Micromachines"
DOI: 10.3390/mi13010108
Abstract: Effects of carbon implantation (C-imp) on the contact characteristics of Ti/Ge contact were investigated. The C-imp into Ti/Ge system was developed to reduce severe Fermi-level pinning (FLP) and to improve the thermal stability of Ti/Ge…
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Keywords:
carbon implantation;
fermi level;
imp;
contact ... See more keywords