High‐Performance and Lithography‐Free Au/WS2/Ag Vertical Schottky Junction Solar Cells
Sign Up to like & getrecommendations! Published in 2023 at "Advanced Materials Interfaces"
DOI: 10.1002/admi.202300031
Abstract: Due to their extraordinarily large optical absorption coefficients, transition metal dichalcogenides (TMDs) are gaining more and more attention for photovoltaic applications. Improving the device performance of a TMD solar cell requires an optimal device architecture… read more here.
Keywords: ws2; lithography free; schottky junction; high performance ... See more keywords
Lithography-Free, Large-Area Spatially Segmented Disordered Structure for Light Harvesting in Photovoltaic Modules.
Sign Up to like & getrecommendations! Published in 2022 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.2c12131
Abstract: Optical losses in photovoltaic (PV) systems cause nonradiative recombination or incomplete absorption of incident light, hindering the attainment of high energy conversion efficiency. The surface of the PV cells is encapsulated to not only protect… read more here.
Keywords: spatially segmented; structure; lithography free; area ... See more keywords
Ultra-Broadband, Lithography-Free, and Large-Scale Compatible Perfect Absorbers: The Optimum Choice of Metal layers in Metal-Insulator Multilayer Stacks
Sign Up to like & getrecommendations! Published in 2017 at "Scientific Reports"
DOI: 10.1038/s41598-017-13837-8
Abstract: We report ultra-broadband perfect absorbers for visible and near-infrared applications that are based on multilayers of metal-insulator (MI) stacks fabricated employing straightforward layer deposition techniques and are, therefore, lithography-free and large-scale compatible. We scrutinize the… read more here.
Keywords: free large; perfect absorbers; ultra broadband; lithography free ... See more keywords
Lithography-free and high-efficiency preparation of black phosphorous devices by direct evaporation through shadow mask
Sign Up to like & getrecommendations! Published in 2022 at "Nanotechnology"
DOI: 10.1088/1361-6528/ac55d5
Abstract: Two-dimensional (2D) materials including black phosphorus (BP) have been extensively investigated because of their exotic physical properties and potential applications in nanoelectronics and optoelectronics. Fabricating BP based devices is challenging because BP is extremely sensitive… read more here.
Keywords: lithography; lithography free; evaporation; direct evaporation ... See more keywords
Lithography-Free Technology for the Preparation of Digital Microfluidic (DMF) Lab-Chips with Droplet Actuation by Optoelectrowetting (OEW)
Sign Up to like & getrecommendations! Published in 2022 at "International Journal of Analytical Chemistry"
DOI: 10.1155/2022/2011170
Abstract: Electrically conducting liquid droplets can be activated and moved by electrowetting-on-dielectric (EWOD) and optoelectrowetting (OEW). An important application is droplet manipulation in digital microfluidics (DMF, lab-on-a-chip 2.0) as a chip-sized chemical laboratory. For spectroscopic analyses… read more here.
Keywords: lab chips; optoelectrowetting oew; lithography free; preparation ... See more keywords
Lithography-free tunable absorber at visible region via one-dimensional photonic crystals consisting of an α-MoO3 layer.
Sign Up to like & getrecommendations! Published in 2022 at "Optics express"
DOI: 10.1364/oe.457528
Abstract: Flexible control of light absorption within the lithography-free nanostructure is crucial for many polarization-dependent optical devices. Herein, we demonstrated that the lithography-free tunable absorber (LTA) can be realized by using two one-dimensional (1D) photonic crystals… read more here.
Keywords: moo3; tunable absorber; lithography free; free tunable ... See more keywords
Lithography-free, manganese-based ultrabroadband absorption through annealing-based deformation of thin layers into metal-air composites.
Sign Up to like & getrecommendations! Published in 2019 at "Optics letters"
DOI: 10.1364/ol.44.003598
Abstract: Fabrication, characterization, and analysis of an ultrabroadband lithography-free absorber is presented. An over 94% average absorption is experimentally achieved in the wavelength range of 450-1400 nm. This ultrabroadband absorption is obtained by a simple annealed trilayer… read more here.
Keywords: manganese based; free manganese; lithography free; structure ... See more keywords
Lithography-Free Bismuth Metamaterials for Advanced Light Manipulation
Sign Up to like & getrecommendations! Published in 2023 at "Photonics"
DOI: 10.3390/photonics10050602
Abstract: Bismuth shows outstanding optical properties, including a metal-like response in the ultraviolet-visible range and a dielectric character with a giant refractive index in the infrared range. In recent years, such unique properties have been employed… read more here.
Keywords: metamaterials advanced; free bismuth; lithography free; advanced light ... See more keywords