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Published in 2021 at "Nanomaterials"
DOI: 10.3390/nano11030822
Abstract: Ultraviolet (UV) Nanoimprint Lithography (NIL) is a replication method that is well known for its capability to address a wide range of pattern sizes and shapes. It has proven to be an efficient production method…
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Keywords:
impact filling;
pattern;
lithography geometrical;
nanoimprint ... See more keywords