Resist-Free Lithography for Monolayer Transition Metal Dichalcogenides.
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DOI: 10.1021/acs.nanolett.1c04081
Abstract: Photolithography and electron-beam lithography are the most common methods for making nanoscale devices from semiconductors. While these methods are robust for bulk materials, they disturb the electrical properties of two-dimensional (2D) materials, which are highly… read more here.
Keywords: lithography; lithography monolayer; transition metal; resist free ... See more keywords