Resistless EUV lithography: Photon-induced oxide patterning on silicon
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DOI: 10.1126/sciadv.adf5997
Abstract: In this work, we show the feasibility of extreme ultraviolet (EUV) patterning on an HF-treated silicon (100) surface in the absence of a photoresist. EUV lithography is the leading lithography technique in semiconductor manufacturing due… read more here.
Keywords: lithography; euv lithography; resistless euv; silicon ... See more keywords