Study on forbidden pitch in plasmonic lithography: taking 365 nm wavelength thin silver film-based superlens imaging lithography as an example.
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DOI: 10.1364/oe.465650
Abstract: Plasmonic lithography can make the evanescent wave at the mask be resonantly amplified by exciting surface plasmon polariton (SPP) and participate in imaging, which can break through the diffraction limit in conventional lithography. It provides… read more here.
Keywords: lithography; pitch plasmonic; plasmonic lithography; forbidden pitch ... See more keywords