Demonstration of a ring-FEL as an EUV lithography tool.
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DOI: 10.1107/s1600577520005676
Abstract: This paper presents the required structure and function of a ring-FEL as a radiation source for extreme ultraviolet radiation lithography (EUVL). A 100 m-long straight section that conducts an extremely low emittance beam from a fourth-generation… read more here.
Keywords: ring fel; euv lithography; lithography tool; lithography ... See more keywords