Deep subwavelength lithography via tunable terahertz plasmons.
Sign Up to like & getrecommendations! Published in 2019 at "Optics express"
DOI: 10.1364/oe.27.023157
Abstract: A scheme to overcome diffraction limit in optical lithography via tunable plasmons is proposed. The plasmons are generated by a current-driven instability and are resonance amplified between the drain and source barriers of the transistor.… read more here.
Keywords: via tunable; lithography via; lithography; deep subwavelength ... See more keywords
Multidirectional UV lithography via inclined/rotated mirrors for liquid materials
Sign Up to like & getrecommendations! Published in 2020 at "Applied Physics Express"
DOI: 10.35848/1882-0786/ab9656
Abstract: This paper presents development of an exposure equipment for inclined/rotating lithography with UV curable liquid materials. The proposed equipment is composed of inclined mirrors rotating around exposure spot and shading plate to prevent direct vertical… read more here.
Keywords: lithography via; liquid materials; via inclined; multidirectional lithography ... See more keywords