Integration of Self-Assembled Monolayers for Cobalt/Porous Low-k Interconnects
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DOI: 10.3390/coatings14091162
Abstract: The integration of self-assembled monolayers (SAM) into cobalt (Co)/porous low-dielectric-constant (low-k) dielectric interconnects is studied in terms of electrical characteristics and reliability in this work. Experimental results indicated that SAM derived from 3-aminopropyltrimethoxysilane (APTMS) improved… read more here.
Keywords: integration self; integration; self assembled; low interconnects ... See more keywords