Roughness Suppression in Electrochemical Nanoimprinting of Si for Applications in Silicon Photonics
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DOI: 10.1002/adma.202206608
Abstract: Metal‐assisted electrochemical nanoimprinting (Mac‐Imprint) scales the fabrication of micro‐ and nanoscale 3D freeform geometries in silicon and holds the promise to enable novel chip‐scale optics operating at the near‐infrared spectrum. However, Mac‐Imprint of silicon concomitantly… read more here.
Keywords: mac imprint; roughness suppression; photonics; electrochemical nanoimprinting ... See more keywords