Scheduling of Dual Resource Constrained Lithography Production: Using CP and MIP/CP
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DOI: 10.1109/tsm.2017.2768899
Abstract: A dual resource constrained (DRC) scheduling problem arises at the photolithography area in semiconductor manufacturing wherein reticles are required as an auxiliary resource. Reticles are transferred from one place to another. While this shared resource… read more here.
Keywords: scheduling problem; resource; resource constrained; machines reticles ... See more keywords