Photocarrier dynamic measurement of rutile TiO2 films prepared by RF magnetron reactive sputtering
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Alloys and Compounds"
DOI: 10.1016/j.jallcom.2017.01.146
Abstract: Abstract In this work, rutile titanium dioxide (TiO 2 ) films were prepared on quartz and SiO 2 /Si substrates utilizing RF magnetron reactive sputtering technology. Crystal structure, surface morphology and optical property of these… read more here.
Keywords: films prepared; photocarrier dynamic; magnetron reactive; rutile ... See more keywords
Application of p-type NiO deposited by magnetron reactive sputtering on GaN vertical diodes
Sign Up to like & getrecommendations! Published in 2021 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2020.105628
Abstract: Abstract In this study, p-NiO deposited by magnetron reactive sputtering was adopted to fabricate NiO/GaN heterojunction and edge termination structure for vertical GaN Schottky barrier diodes. The contact properties of the NiO/GaN heterojunction were evaluated… read more here.
Keywords: nio; diode; nio deposited; deposited magnetron ... See more keywords