Artificial intelligent matching for scratches of semiconductor wafers based on a K-NN algorithm
Sign Up to like & getrecommendations! Published in 2019 at "Surface Topography: Metrology and Properties"
DOI: 10.1088/2051-672x/ab1ca3
Abstract: Scratches, those usually generated during polishing the silicon wafer surface, are one of the major yield loss factors in semiconductor manufacturing industry. In order to determine the source of the scratches in real time and… read more here.
Keywords: matching scratches; main lines; intelligent matching; semiconductor wafers ... See more keywords
Identification of the Main Lines of Research in Gastronomic Tourism: A Review of the Literature
Sign Up to like & getrecommendations! Published in 2023 at "Sustainability"
DOI: 10.3390/su15075971
Abstract: This article presents a review of research trends in gastronomic tourism. The objective is to identify the main lines of research of this type of tourism based on the scientific production published in the last… read more here.
Keywords: lines research; gastronomic tourism; main lines; research gastronomic ... See more keywords