Ni-Al Alloys as Alternative EUV Mask Absorber
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DOI: 10.3390/app8040521
Abstract: Extreme ultraviolet (EUV) lithography is being industrialized as the next candidate printing technique for high-volume manufacturing of scaled down integrated circuits. At mask level, the combination of EUV light at oblique incidence, absorber thickness, and… read more here.
Keywords: euv mask; mask; mask absorber; absorber materials ... See more keywords