Fabrication of plasmonic nanostructures by hole-mask colloidal lithography: Recent development
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DOI: 10.1016/j.apmt.2018.12.014
Abstract: Abstract Hole-mask colloidal lithography (HCL) using self-assembled colloidal polymer nanospheres to create masks is a versatile technique to fabricate nanostructure arrays over wafer-scale areas. It is a powerful and cost-effective tool to produce plasmonic nanostructures.… read more here.
Keywords: mask colloidal; colloidal lithography; hole mask; plasmonic nanostructures ... See more keywords