Inert Mask Lithography of Edge Narrowed Graphene Nanoribbons Directly Contacted to Metallic Electrodes
Sign Up to like & getrecommendations! Published in 2021 at "Advanced Materials Interfaces"
DOI: 10.1002/admi.202100293
Abstract: Patterning graphene into strips with nanometer‐scale widths, i.e. graphene nanoribbons, is an effective approach to customize different properties of the material. Narrowing a large sheet of graphene via conventional top‐down approaches meets the intrinsic resolution… read more here.
Keywords: chemistry; graphene nanoribbons; edge; mask lithography ... See more keywords
KPFM and CAFM based studies of MoS2 (2D)/WS2 heterojunction patterns fabricated using stencil mask lithography technique
Sign Up to like & getrecommendations! Published in 2017 at "Journal of Alloys and Compounds"
DOI: 10.1016/j.jallcom.2017.06.203
Abstract: Abstract Vertical heterojunctions formed by layer-by-layer stacking of two-dimensional (2D) transition metal dichalcogenides (TMDs) are believed to be the key element of next-generation optoelectronic devices. For developing devices based on such heterostructures, their patterned arrays… read more here.
Keywords: kpfm cafm; stencil mask; mask lithography; microscopy ... See more keywords