A high-speed exposure method for digital micromirror device based scanning maskless lithography system
Sign Up to like & getrecommendations! Published in 2019 at "Optik"
DOI: 10.1016/j.ijleo.2019.04.009
Abstract: Abstract During the process of scanning maskless lithography, exposure speed determines the efficiency and productivity of lithography fabrication. In this paper, a novel Digital Micromirror Device(DMD) based high-speed exposure method is proposed to optimize the… read more here.
Keywords: speed; maskless; method; lithography ... See more keywords
Substrate-Independent Maskless Writing of Functionalized Microstructures Using CHic Chemistry and Digital Light Processing
Sign Up to like & getrecommendations! Published in 2022 at "ACS Applied Materials & Interfaces"
DOI: 10.1021/acsami.2c12000
Abstract: Maskless photolithography based on digital light processing (DLP) is an attractive technique for the rapid, flexible, and cost-effective fabrication of complex structures with arbitrary surface profiles on the microscale. In this work, we introduce a… read more here.
Keywords: light processing; substrate independent; maskless; chemistry ... See more keywords