Maskless lithography based on oblique scanning of point array with digital distortion correction
Sign Up to like & getrecommendations! Published in 2021 at "Optics and Lasers in Engineering"
DOI: 10.1016/j.optlaseng.2020.106313
Abstract: Abstract The oblique scanning of a rectangular array of ultraviolet (UV) spots provides a feasible means of realizing maskless lithography with well-controlled UV exposure. In such a method, the UV light is modulated by a… read more here.
Keywords: array; distortion; maskless lithography; oblique scanning ... See more keywords
Quantum Dot Patterning and Encapsulation by Maskless Lithography for Display Technologies.
Sign Up to like & getrecommendations! Published in 2023 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.2c20982
Abstract: For their unique optical properties, quantum dots (QDs) have been extensively used as light emitters in a number of photonic and optoelectronic applications. They even met commercialization success through their implementation in high-end displays with… read more here.
Keywords: patterning encapsulation; encapsulation; maskless lithography; qds ... See more keywords
Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography
Sign Up to like & getrecommendations! Published in 2019 at "IEEE Photonics Journal"
DOI: 10.1109/jphot.2019.2950281
Abstract: Microstructures are fabricated with a fast fabrication speed, submicron-scale precision and a minimum feature size of 1.5 μm. The proposed rapid prototyping fabrication method takes advantage of the maskless lithography technique based on a digital… read more here.
Keywords: maskless lithography; dmd based; rapid prototyping; lithography ... See more keywords
Analyses of pattern quality in roll-to-roll digital maskless lithography with positional errors.
Sign Up to like & getrecommendations! Published in 2021 at "Applied optics"
DOI: 10.1364/ao.416623
Abstract: In roll-to-roll digital maskless lithography (R2R DML) equipment, it is difficult to achieve high quality, owing to surface deformation that affects the pattern position. To address this issue, we simulated the patterning results of R2R… read more here.
Keywords: maskless lithography; roll roll; roll digital; digital maskless ... See more keywords