Mathematical Evaluation of a-Si:H Film Formation in rf-PECVD Systems
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DOI: 10.1007/s12633-019-00167-9
Abstract: Radio frequency plasma enhanced chemical vapor deposition (rf-PECVD) is an efficient technique for preparing hydrogenated amorphous silicon (a-Si:H) layers used in thin film silicon solar cells. The most important parameters in a PECVD system are… read more here.
Keywords: pecvd; film formation; mathematical evaluation; deposition ... See more keywords