Perspective: Optical measurement of feature dimensions and shapes by scatterometry
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DOI: 10.1063/1.5018310
Abstract: The use of optical scattering to measure feature shape and dimensions, scatterometry, is now routine during semiconductor manufacturing. Scatterometry iteratively improves an optical model structure using simulations that are compared to experimental data from an… read more here.
Keywords: measurement feature; feature; gaa transistor; perspective optical ... See more keywords