Measurement of Wafer Focus by Grating Shearing Interferometry
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DOI: 10.3390/app10217467
Abstract: A method applied for improving the measurement precision and efficiency of wafer focusing in an optical lithography instrument (OLI) is introduced. Based on grating shearing interferometry, the defocus and tilt of the wafer are measured… read more here.
Keywords: wafer focus; grating shearing; measurement wafer; shearing interferometry ... See more keywords