Study of Profile Changes during Mechanical Polishing using Relocation Profilometry
Sign Up to like & getrecommendations! Published in 2019 at "Journal of The Institution of Engineers (India): Series C"
DOI: 10.1007/s40032-017-0387-5
Abstract: Mechanical polishing is a finishing process practiced conventionally to enhance quality of surface. Surface finish is improved by mechanical cutting action of abrasive particles on work surface. Polishing is complex in nature and research efforts… read more here.
Keywords: mechanical polishing; process; relocation; study ... See more keywords
The effect of the interface reaction mode on chemical mechanical polishing
Sign Up to like & getrecommendations! Published in 2020 at "Cirp Journal of Manufacturing Science and Technology"
DOI: 10.1016/j.cirpj.2020.08.005
Abstract: Abstract Chemical mechanical polishing (CMP) slurries play an important role in the finishing processes of optical components. This paper studies the effect of the interface reaction mode on the polishing performance by comparing the solid–solid… read more here.
Keywords: reaction mode; mechanical polishing; reaction; interface ... See more keywords
Limits of single crystal diamond surface mechanical polishing
Sign Up to like & getrecommendations! Published in 2018 at "Diamond and Related Materials"
DOI: 10.1016/j.diamond.2018.05.016
Abstract: Abstract We demonstrate the process of mechanical polishing of a single crystal diamond substrate to a roughness of no >0.5 nm. We used the anisotropy of the polishing intensity depending on the crystallographic orientation of the… read more here.
Keywords: single crystal; surface; limits single; crystal diamond ... See more keywords
A Reynolds equation modelling Coriolis force effects on chemical mechanical polishing
Sign Up to like & getrecommendations! Published in 2017 at "International Journal of Non-linear Mechanics"
DOI: 10.1016/j.ijnonlinmec.2017.04.003
Abstract: Abstract A Reynolds equation modelling chemical mechanical polishing in cylindrical polar coordinates is derived. Coriolis force effects are included in the derivation of the model equation. The main effect of the Coriolis force is to… read more here.
Keywords: reynolds equation; equation modelling; force; mechanical polishing ... See more keywords
Improvement in chemical mechanical polishing of 4H-SiC wafer by activating persulfate through the synergistic effect of UV and TiO2
Sign Up to like & getrecommendations! Published in 2021 at "Journal of Materials Processing Technology"
DOI: 10.1016/j.jmatprotec.2021.117150
Abstract: Abstract Chemical mechanical polishing (CMP) has revolutionized the processing of semiconductor material such as silicon carbide (SiC). However, the strong chemical bond between silicon atoms and carbon atoms gives SiC materials a very high mechanical… read more here.
Keywords: effect tio2; mechanical polishing; chemical mechanical; tio2 ... See more keywords
Trajectory uniformity of the double-sided mechanical polishing of SiC single crystal substrate
Sign Up to like & getrecommendations! Published in 2020 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2019.104814
Abstract: Abstract SiC single crystal substrate has a useful range of physical, mechanical and electronic properties that makes it a promising material for semiconductor devices. To obtain the relationship between a certain abrasive on the polishing… read more here.
Keywords: polishing; single crystal; crystal substrate; mechanical polishing ... See more keywords
Potassium tartrate as a complexing agent for chemical mechanical polishing of Cu/Co/TaN barrier liner stack in H2O2 based alkaline slurries
Sign Up to like & getrecommendations! Published in 2020 at "Materials Science in Semiconductor Processing"
DOI: 10.1016/j.mssp.2019.104883
Abstract: Abstract The chemical mechanical polishing (CMP) of Cu/Co/TaN barrier liner stack of the sub-14nm devices was associated with several challenges, one of which was to screen out the desired slurries formulation. In this paper, the… read more here.
Keywords: tan barrier; barrier; mechanical polishing; potassium tartrate ... See more keywords
Thermo-mechanical Effects in Mechanical Polishing of Natural Fiber Composites
Sign Up to like & getrecommendations! Published in 2018 at "Procedia Manufacturing"
DOI: 10.1016/j.promfg.2018.07.038
Abstract: Abstract Efficient machining and finishing of natural fiber reinforced plastic (NFRP) composites is essential for realizing the industrial application envisaged of these promising, environmentally friendly materials. While prior efforts allude to the multiscale nature of… read more here.
Keywords: effects mechanical; thermo mechanical; fiber; natural fiber ... See more keywords
Investigation of the pad-conditioning performance deterioration in the chemical mechanical polishing process
Sign Up to like & getrecommendations! Published in 2017 at "Wear"
DOI: 10.1016/j.wear.2017.07.019
Abstract: Abstract The surface roughness of a chemical mechanical polishing (CMP) pad provides microscopic asperities where the actual polishing takes place. Thus, the roughness should be maintained in a proper regimen to obtain stable CMP process… read more here.
Keywords: cmp; surface; process; mechanical polishing ... See more keywords
New Atomistic Insights on the Chemical Mechanical Polishing of Silica Glass with Ceria Nanoparticles
Sign Up to like & getrecommendations! Published in 2023 at "Langmuir"
DOI: 10.1021/acs.langmuir.3c00304
Abstract: Reactive molecular dynamics simulations have been used to simulate the chemical mechanical polishing (CMP) process of silica glass surfaces with the ceria (111) and (100) surfaces, which are predominantly found in ceria nanoparticles. Since it… read more here.
Keywords: ceria nanoparticles; chemical mechanical; mechanical polishing; glass ... See more keywords
Unprecedented atomic surface of silicon induced by environmentally friendly chemical mechanical polishing.
Sign Up to like & getrecommendations! Published in 2023 at "Nanoscale"
DOI: 10.1039/d3nr01149f
Abstract: Silicon (Si) dominates the integrated circuit (IC), semiconductor, and microelectronic industries. However, it is a challenge to achieve a sub-angstrom surface of Si. Chemical mechanical polishing (CMP) is widely used in the manufacturing of Si,… read more here.
Keywords: cmp; surface; environmentally friendly; chemical mechanical ... See more keywords