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Published in 2022 at "Advanced Materials"
DOI: 10.1002/adma.202204982
Abstract: Van der Waals (vdW) heterostructures have drawn much interest over the last decade owing to their absence of dangling bonds and their intriguing low‐dimensional properties. The emergence of 2D materials has enabled the achievement of…
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Keywords:
van der;
memory window;
der waals;
layered ge4se9 ... See more keywords
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Published in 2024 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.3c16427
Abstract: Preventing ferroelectric materials from losing their ferroelectricity over a low thickness of several nanometers is crucial in developing multifunctional nanoelectronics. Epitaxially grown 5 at. % yttrium-doped Hf0.5Zr0.5O2 (YHZO) thin films exhibit an atomically smooth surface,…
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Keywords:
memory window;
memory;
yttrium doped;
ferroelectric thin ... See more keywords
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Published in 2021 at "Nanoscale"
DOI: 10.1039/d1nr05107e
Abstract: Ferroelectric field-effect transistors (FeFETs) with a single gate structure and using the newly discovered ferroelectric hafnium oxide as an active material are attracting considerable interest for nonvolatile memory devices. However, such FeFETs struggle to achieve…
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Keywords:
memory window;
double gate;
free read;
disturb free ... See more keywords
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Published in 2024 at "Applied Physics Letters"
DOI: 10.1063/5.0196442
Abstract: The nitridation process can significantly improve the quality of the interfacial layer and suppress the unrecoverable electron trapping of the interfacial states during cycling, which is the main cause of endurance enhancement. In this work,…
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Keywords:
memory window;
degradation;
endurance enhancement;
window degradation ... See more keywords
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Published in 2017 at "International Journal of Production Research"
DOI: 10.1080/00207543.2016.1221160
Abstract: Inspired by the latest empirical studies, we propose a new updating model for reference prices by assuming that consumers’ memories are limited and their recall of previous prices obeys a first-order Markov stochastic process. We…
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Keywords:
memory window;
reference effects;
reference;
dynamic pricing ... See more keywords
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Published in 2024 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2024.3467210
Abstract: We study the disturb characteristics of ferroelectric field-effect transistors (FEFETs) with band-engineered gate stacks. We demonstrate that integrating a dielectric Al2O3 layer within the ferroelectric (FE) Hf $_{{0}.{5}}$ Zr $_{{0}.{5}}$ O2 layer in the gate…
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Keywords:
memory window;
memory;
ferroelectric field;
disturb ... See more keywords
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Published in 2025 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2025.3610413
Abstract: In this work, HfO2/Ozone SiO2 interfacial layer (IL) and ZnS:SiO2 (ZSO) liner stressor are novelly integrated with nanoscale Hf0.5Zr0.5O2 (HZO) FeFETs for the memory window (MW) enhancement. With the HfO2/Ozone SiO2 IL engineering, the MW…
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Keywords:
window enhancement;
sub;
memory window;
sub sub ... See more keywords
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Published in 2024 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2024.3418942
Abstract: In this work, with the goal of developing a large memory window (MW) ferroelectric field-effect transistor (FeFET) for high-density stand-alone storage applications, we provide a deep look into the MW of a FeFET and clarify…
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Keywords:
memory window;
window ferroelectric;
memory;
dielectric layer ... See more keywords
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Published in 2025 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2025.3589546
Abstract: This study systematically investigates the modulation of the memory window (MW) in interfacial layer (IL)-free and Hfx $Zr_{{1}-{x}}$ O2 (HZO)-based ferroelectric field-effect transistors (FeFETs) with oxide channel by engineering oxide semiconductor materials, annealing processes, and…
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Keywords:
layer;
semiconductor;
memory window;
oxide semiconductor ... See more keywords