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Published in 2019 at "Journal of Computational Electronics"
DOI: 10.1007/s10825-019-01320-8
Abstract: An improved theoretical model for metal–ferroelectric–metal–insulator–semiconductor field-effect transistors (MFMIS FETs) is presented. The basic theory describing the ferroelectric behavior is replaced by the dipole switching theory (DST) because of its deeper physical meaning and its…
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Keywords:
metal;
metal ferroelectric;
ferroelectric metal;
field effect ... See more keywords
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Published in 2018 at "AIP Advances"
DOI: 10.1063/1.5031162
Abstract: The flexoelectricity in a 100 nm-thick BaTiO3 (BTO) thin film based metal/ferroelectric insulator/semiconductor (MFS) heterostructure was reported in this letter. The transverse flexoelectric coefficient of the BTO thin film in the heterojunction structure was measured…
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Keywords:
metal ferroelectric;
flexoelectricity;
semiconductor;
thin film ... See more keywords
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Published in 2022 at "Materials"
DOI: 10.3390/ma15217475
Abstract: The transport mechanism of HfO2-based metal-ferroelectric-metal (MFM) capacitors was investigated using low-frequency noise (LFN) measurements for the first time. The current–voltage measurement results revealed that the leakage behavior of the fabricated MFM capacitor was caused…
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Keywords:
hfo2 based;
noise;
metal ferroelectric;
based metal ... See more keywords
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Published in 2022 at "Nanomaterials"
DOI: 10.3390/nano12030468
Abstract: In this work, the ferroelectric characteristic of a 5 nm Hf0.5Zr0.5O2 (HZO) metal-ferroelectric-insulator-semiconductor (MFIS) device is enhanced through strained complementary metal oxide semiconductor (CMOS)-compatible TiN electrode engineering. Strained TiN top-layer electrodes with different nitrogen (N)…
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Keywords:
tin electrode;
metal ferroelectric;
ferroelectric insulator;
strained tin ... See more keywords