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Published in 2017 at "Journal of Electronic Materials"
DOI: 10.1007/s11664-016-5199-5
Abstract: The basic requirements on process design of extremely scaled devices involve appropriate work function and tight doping control due to their significant effect on the threshold voltage as well as other critical electrical parameters such…
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Keywords:
work function;
function;
source drain;
metal gate ... See more keywords
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Published in 2017 at "Silicon"
DOI: 10.1007/s12633-017-9631-0
Abstract: The paper reports the analytical model for the analysis of the effects of channel doping on the threshold voltage. A silicon germanium p-MOSFET with high-k dielectric material along with a metal gate is used for…
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Keywords:
mosfet;
threshold voltage;
channel doping;
doping threshold ... See more keywords
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Published in 2019 at "Silicon"
DOI: 10.1007/s12633-019-00163-z
Abstract: In the recent sub-20 nm technology node, the process variability issues have become a major problem for scaling of MOS devices. We present a design for a strained Si/SiGe FinFET on an insulator using a 3D…
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Keywords:
variability wfv;
variability;
work function;
electrical parameters ... See more keywords
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Published in 2017 at "Current Applied Physics"
DOI: 10.1016/j.cap.2017.11.015
Abstract: Abstract The novel material selection and fabrication became a major concern due to scaling limitations when the technology node was below 20 nm. Complex gate-last process step for high-k metal gate (HKMG) device was proposed to…
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Keywords:
material lattice;
gate;
metal gate;
high metal ... See more keywords
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Published in 2019 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2019.04.024
Abstract: Abstract This paper presented findings on statistical impact of mole fraction (x) on threshold voltage, on current, and off current in high-k/metal gate SiGe channel Tunnel FET (TFET) due to work function variability (WFV) of…
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Keywords:
metal gate;
gate;
high metal;
grain ... See more keywords
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Published in 2019 at "Microelectronic Engineering"
DOI: 10.1016/j.mee.2019.05.005
Abstract: Abstract Electrical properties of Y2O3/SiGe metal-oxide-semiconductor (MOS) capacitors with Al, Au, W and TiN gate electrodes have been evaluated in order to study the impact of the metal gate electrodes on Y2O3/SiGe interface properties. It…
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Keywords:
electrical properties;
properties y2o3;
gate electrodes;
impact metal ... See more keywords
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Published in 2017 at "Journal of Applied Physics"
DOI: 10.1063/1.4978357
Abstract: A significant degradation of the mobility has been repeatedly observed at low inversion density in high-κ/metal gate metal-oxide-semiconductor field-effect transistors. However, the scattering mechanisms responsible for this degradation are still debated. It is often assumed…
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Keywords:
carrier scattering;
metal;
sio2 hfo2;
metal gate ... See more keywords
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Published in 2018 at "IEEE Journal of the Electron Devices Society"
DOI: 10.1109/jeds.2018.2809587
Abstract: In this paper, we propose the extendibility of ultra-thin body and box (UTBB) devices to 7 and 5 nm technology nodes focusing on electrostatics. A difficulty in scaling traditional UTBB is the need for SOI…
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Keywords:
fdsoi device;
advanced fdsoi;
electrostatics;
metal gate ... See more keywords
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Published in 2018 at "IEEE Journal of the Electron Devices Society"
DOI: 10.1109/jeds.2018.2864581
Abstract: In this combined experiment and simulation study we investigate a SiGe/Si based gatenormal tunneling field-effect transistor (TFET) with a pillar shaped contact to the tunneling junction which brings forth two significant advantages. The first, is…
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Keywords:
dual metal;
gate;
effect;
metal gate ... See more keywords
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3
Published in 2023 at "IEEE Electron Device Letters"
DOI: 10.1109/led.2023.3264916
Abstract: The performance of 101-stage ring oscillator is effectively improved by the undercut process of metal gate for 28 nm high-k first metal gate-last planar CMOS technology. Using a simple over-etch process after dummy poly-Si gate…
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Keywords:
metal gate;
gate undercut;
gate;
ring oscillator ... See more keywords
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Published in 2018 at "IEEE Transactions on Electron Devices"
DOI: 10.1109/ted.2017.2786144
Abstract: This paper utilizes electrical analyses and a study of physical mechanisms to investigate metal gate structure-dependent performance in amorphous InGaZnO (a-IGZO) thin-film transistors. The effects of different shielding areas between the IGZO layer and metal…
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Keywords:
metal gate;
light illumination;
gate length;
gate ... See more keywords