Large-Area Nanopatterning Based on Field Alignment by Microscale Metal Mask for Etching Process.
Sign Up to like & getrecommendations! Published in 2019 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.9b09730
Abstract: Recently, researchers have dedicated efforts toward producing large-area nanostructures using advanced lithography techniques and state-of-the-art etching methods. However, these processes involve challenges such as the diffraction limit and an unintended etching profile. In this work,… read more here.
Keywords: mask; field; metal mask; process ... See more keywords
Fine Metal Mask 3-Dimensional Measurement by using Scanning Digital Holographic Microscope
Sign Up to like & getrecommendations! Published in 2018 at "Journal of the Korean Physical Society"
DOI: 10.3938/jkps.72.863
Abstract: For three-dimensional microscopy, fast and high axial resolution are very important. Extending the depth of field for digital holographic is necessary for three-dimensional measurements of thick samples. We propose an optical sectioning method for optical… read more here.
Keywords: fine metal; scanning digital; digital holographic; metal mask ... See more keywords