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Published in 2017 at "Results in physics"
DOI: 10.1016/j.rinp.2017.04.021
Abstract: Abstract The Fe thin films with different initial thickness were prepared on MgO(0 0 1) substrate. Ar + ion beam having energy of 3 keV was used to sputter the film at incident angle of 80° with respect…
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Keywords:
beam sputtering;
thin films;
mgo substrate;
magnetic anisotropy ... See more keywords