Effect of processing factors on the microstructure and gradual diffusion of tungstenized layers
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DOI: 10.1016/j.apsusc.2017.10.040
Abstract: Abstract The refractory tungsten (W) coating due to its low sputtering yield is not easy to be obtained, and the bonds between the W coating and its substrate are weak and easily broken. A novel… read more here.
Keywords: factors microstructure; effect processing; microstructure gradual; processing factors ... See more keywords