Collaborative Applying the Ultra-low-k Dielectric and the High-k Dielectric Materials for Performance Enhancement in Coupled Multilayer Graphene Nanoribbon Interconnects
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DOI: 10.1109/jeds.2020.2975074
Abstract: Based on transmission line modeling, a new technology of collaborative applying the ultra-low-k dielectric and the high-k dielectric materials in coupled multilayer graphene nanoribbon (MLGNR) interconnects (i.e., case 4) to reduce propagation delay and to… read more here.
Keywords: mlgnr interconnects; propagation delay; case;