Modeling of Gate Stack Patterning for Advanced Technology Nodes: A Review
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DOI: 10.3390/mi9120631
Abstract: Semiconductor device dimensions have been decreasing steadily over the past several decades, generating the need to overcome fundamental limitations of both the materials they are made of and the fabrication techniques used to build them.… read more here.
Keywords: stack patterning; modeling gate; technology; patterning advanced ... See more keywords