Morphology controlling of 〈111〉-3C–SiC films by HMDS flow rate in LCVD
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DOI: 10.1039/c8ra09509d
Abstract: Morphology of 〈111〉-oriented 3C–SiC films was transformed from mosaic to whisker to cauliflower-like with the increased flow rate (f) of hexametyldisilane (HMDS) in the process of laser chemical vapor deposition (LCVD). read more here.
Keywords: morphology controlling; controlling 111; flow rate; sic films ... See more keywords