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Published in 2020 at "Semiconductors"
DOI: 10.1134/s1063782620020025
Abstract: Abstract A new quantitative model of the effect of the gate bias on the threshold voltage of metal-oxide-semiconductor (MOS) structures under ionizing irradiation is developed based on the consideration of hole trapping from the entire…
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Keywords:
gate bias;
model effect;
gate;
effect gate ... See more keywords