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Published in 2018 at "Semiconductors"
DOI: 10.1134/s1063782618160029
Abstract: In this work, the DC and RF performance of a 20 nm gate length novel metal oxide semiconductor high electron mobility transistor (MOSHEMT) on Silicon substrate is studied using Sentaurus TCAD tool. The proposed MOSHEMT…
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Keywords:
silicon substrate;
wave applications;
performance;
moshemt silicon ... See more keywords