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Published in 2017 at "IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems"
DOI: 10.1109/tcad.2017.2681068
Abstract: Multiple patterning lithography has been recognized as one of the most promising solutions, in addition to extreme ultraviolet lithography, directed self-assembly, nanoimprint lithography, and electron beam lithography, for advancing the resolution limit of conventional optical…
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Keywords:
multiple patterning;
complex coloring;
coloring rules;
layout decomposition ... See more keywords
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Published in 2018 at "Optics letters"
DOI: 10.1364/ol.43.001866
Abstract: We demonstrate that multiple exposures of a two-component holographic photopolymer can quadruple the refractive index contrast of the material beyond the single-exposure saturation limit. Quantitative phase microscopy of isolated structures written by laser direct-write lithography…
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Keywords:
index;
patterning holographic;
multiple patterning;
index contrast ... See more keywords