Supervised Multivariate Kernel Density Estimation for Enhanced Plasma Etching Endpoint Detection
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DOI: 10.1109/access.2022.3155513
Abstract: The advancement of semiconductor technology nodes requires precise control of their manufacturing process, including plasma etching, which is highly important in terms of the yield, cost, and device performance. Endpoint detection (EPD) is an imperative… read more here.
Keywords: endpoint detection; multivariate kernel; plasma etching; density estimation ... See more keywords