Fabrication of 2D silicon nano-mold by side etch lift-off method
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DOI: 10.1088/1361-6528/abf50e
Abstract: Nano-imprint technology is a method of nano-pattern reproduction, has the characteristics of high resolution, high throughput, and low-cost. It can reduce the complexity and cost of the equipment while improving the resolution, which considered a… read more here.
Keywords: silicon nano; nano mold; mold side; method ... See more keywords
A low-cost and high-efficiency method for four-inch silicon nano-mold by proximity UV exposure.
Sign Up to like & getrecommendations! Published in 2021 at "Nanotechnology"
DOI: 10.1088/1361-6528/ac25ab
Abstract: Nano-mold is an essential tool for nano-imprinting. However, large-area nano-mold fabrication relies on expensive equipment or complicated processing. silicon nano-molds were achieved by proximity ultraviolet (UV) lithography and reactive ion etching. By optimizing the parameters… read more here.
Keywords: silicon nano; nano mold; four inch; exposure ... See more keywords