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Published in 2021 at "Optics Communications"
DOI: 10.1016/j.optcom.2020.126589
Abstract: Abstract In this work, the method of etching the metal-ion-implanted dielectric via a patterned electron beam (EB) resist mask was used to fabricate the metal/glass nanocomposite arrays with prospective applications. Following the method, the Au/SiO2…
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Keywords:
fabrication two;
nanocomposite arrays;
two dimensional;
dimensional sio2 ... See more keywords