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Published in 2024 at "ACS applied materials & interfaces"
DOI: 10.1021/acsami.4c07793
Abstract: We present a new approach to achieve nanoscale transistors on ultrathin flexible substrates with conventional electron-beam lithography. Full devices are first fabricated on a gold sacrificial layer covering a rigid silicon substrate, and then coated…
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Keywords:
nanoscale amorphous;
oxide transistors;
amorphous oxide;
flexible substrates ... See more keywords