Nanoscale Depth Profiling of Residual Stresses Due to Fine Surface Finishing
Sign Up to like & getrecommendations! Published in 2019 at "Advanced Materials Interfaces"
DOI: 10.1002/admi.201900947
Abstract: Mechanical polishing is commonly used for both surface finishing and metallographic sample preparation for a broad range of materials. However, polishing causes local deformation and induces residual stress, which has an important effect on many… read more here.
Keywords: depth; surface; residual stress; surface finishing ... See more keywords
Nanoscale depth control of implanted shallow silicon vacancies in silicon carbide.
Sign Up to like & getrecommendations! Published in 2019 at "Nanoscale"
DOI: 10.1039/c9nr05938e
Abstract: Color centers in silicon carbide have recently attracted broad interest as high bright single photon sources and defect spins with long coherence time at room temperature. There have been several methods to generate silicon vacancy… read more here.
Keywords: depth; silicon carbide; nanoscale depth; depth control ... See more keywords
Correlations between Microstructure and Residual Stress of Nanoscale Depth Profiles for TSV-Cu/TiW/SiO2/Si Interfaces after Different Thermal Loading
Sign Up to like & getrecommendations! Published in 2023 at "Materials"
DOI: 10.3390/ma16010449
Abstract: In this paper, the residual stresses with a nanoscale depth resolution at TSV-Cu/TiW/SiO2/Si interfaces under different thermal loadings are characterized using the ion-beam layer removal (ILR) method. Moreover, the correlations of residual stress, microstructure, and… read more here.
Keywords: stress; residual stress; tiw sio2; tsv tiw ... See more keywords