Nanoscale Resist‐Free Patterning of Halogenated Zeolitic Imidazolate Frameworks by Extreme UV Lithography
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DOI: 10.1002/advs.202415804
Abstract: Advancements in patterning techniques for metal–organic frameworks (MOFs) are crucial for their integration into microelectronics. However, achieving precise nanoscale control of MOF structures remains challenging. In this work, a resist‐free method for patterning MOFs is… read more here.
Keywords: resist; nanoscale resist; resist free; free patterning ... See more keywords