Quantification of local strain distributions in nanoscale strained SiGe FinFET structures
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DOI: 10.1063/1.4991472
Abstract: Strain within nanoscale strained SiGe FinFET structures has been investigated using a combination of X-ray diffraction and transmission electron microscopy-based nanobeam diffraction (NBD) techniques to reveal the evolution of the stress state within the FinFETs.… read more here.
Keywords: nanoscale strained; sige finfet; finfet structures; stress ... See more keywords