Morphological, structural and photoresponse characterization of ZnO nanostructure films deposited on plasma etched silicon substrates
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DOI: 10.22052/jns.2020.01.020
Abstract: ZnO nanostructure films were deposited by radio frequency (RF) magnetron sputtering on etched silicon (100) substrates using dry Ar/SF6 plasma, at two etching times of 5 min and 30 min, and on non etched silicon… read more here.
Keywords: films deposited; etched silicon; nanostructure films; zno nanostructure ... See more keywords