LAUSR

Nanowire-Aware Routing Considering High Cut Mask Complexity

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0 Published in 2017 at "IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems"

DOI: 10.1109/tcad.2016.2614777

Abstract: 1-D nanowires are one of the most promising next-generation lithography technologies for 7 nm process node and beyond. The 1-D nanowire process first constructs a 1-D nanoarray through template synthesis followed by line-end cutting with… read more here.

Keywords: cut mask; nanowire aware; aware routing; cut ... See more keywords