Negative-tone molecular glass photoresist for high-resolution electron beam lithography
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DOI: 10.1098/rsos.202132
Abstract: A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern… read more here.
Keywords: tone molecular; tone; photoresist; molecular glass ... See more keywords