Plasma-enhanced atomic layer deposition of nickel nanotubes with low resistivity and coherent magnetization dynamics for 3D spintronics.
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DOI: 10.1021/acsami.0c06879
Abstract: We report plasma-enhanced atomic layer deposition (ALD) to prepare conformal nickel thin films and nanotubes by using nickelocene as a precursor, water as the oxidant agent and an in-cycle plasma enhanced reduction step with hydrogen.… read more here.
Keywords: enhanced atomic; atomic layer; layer deposition; nickel nanotubes ... See more keywords