Effects of Nitrogen Partial Pressure Ratio and Anneal Temperature on the Properties of Al–N Co-Doped ZnO Thin Films
Sign Up to like & getrecommendations! Published in 2018 at "Journal of Electronic Materials"
DOI: 10.1007/s11664-018-6294-6
Abstract: The authors report the conversion of conduction type from n-type to p-type in the Al–N co-doped ZnO thin films by using thermal annealing treatment under argon atmosphere. The samples were deposited on fused silica by… read more here.
Keywords: thin films; partial pressure; zno thin; nitrogen partial ... See more keywords
Evolution of chemical, structural, and mechanical properties of titanium nitride thin films deposited under different nitrogen partial pressure
Sign Up to like & getrecommendations! Published in 2020 at "Results in physics"
DOI: 10.1016/j.rinp.2020.103416
Abstract: Abstract In this study, to explore the impact of nitrogen on chemical composition, morphology, microstructure, as well as intrinsic stress of titanium films, nitrogen-doped titanium thin films prepared by direct current reactive magnetron sputtering, with… read more here.
Keywords: thin films; stress; tin; nitrogen ... See more keywords
Effect of Nitrogen Partial Pressure on Structure, Mechanical Property, and Corrosion Behavior of ZrNx Films Prepared by Reactive DC Magnetron Sputtering.
Sign Up to like & getrecommendations! Published in 2023 at "Scanning"
DOI: 10.1155/2023/3604077
Abstract: ZrNx films were deposited by DC magnetron sputtering with pure Zr target in different nitrogen partial pressure atmospheres (r = N2/[Ar + N2]). The structure and composition of the thin films were characterized as a… read more here.
Keywords: zrnx films; structure; zrnx; nitrogen partial ... See more keywords