Tribochemical nanolithography: selective mechanochemical removal of photocleavable nitrophenyl protecting groups with 23 nm resolution at speeds of up to 1 mm s−1
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DOI: 10.1039/d2sc06305k
Abstract: We describe the mechanochemical regulation of a reaction that would otherwise be considered to be photochemical, via a simple process that yields nm spatial resolution. An atomic force microscope (AFM) probe is used to remove… read more here.
Keywords: photocleavable nitrophenyl; resolution; nitrophenyl protecting; protecting groups ... See more keywords